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Home | Microelectronics | CMP
CMP Polishing Slurry Filtration Solution
Accurate Retention Efficiency Remove defective particles while allowing effective particles to pass through Nano-fiber Media Multi-layer Nano-fiber media provides high flow rates One-piece Construction One-piece construction means it's easy to install, clean, | Strict Japanese quality assurance to ensure product stability Graded Pore Structure Effectively removes defective particles and high Patent on Filter Construction Design Perfectly integrate depth, pleated and rolled |
Keevalid™ | 0.05μm-11μm | ![]() |
Privalid™ | 0.1μm-1.5μm | ![]() |
Provalid™ | 0.05μm-5.0μm | ![]() |
Hangzhou Cobetter Filtration Equipment Co.,Ltd
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86-571-87704359(English)
86-571-87704270(Japanese)
sale@cobetterfilter.com
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19/F, Building B, Huanyu Business Center, No.626 Kejiguan Road Binjiang District, Hangzhou 310052, China
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Heshang Industry Section,Xiaoshan,Hangzhou 310053,China
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