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Home | Semiconductors | Photoresist| Photogile POU Filter for Lithography Process

Photogile POU Filter for Lithography Process

One-piece construction is easy to install, clean and replace this filter capsule

Unique vent structure effectively removes bubbles in the photoresist

Available in a wide range of membranes to meet all customer requirements

Strict Japanese quality assurance ensures product stability

Product Specification

Filter Membrane	UPE / Nylon / Multi/ HAPES / PTFE
Cage / Core / End Caps	HDPE
Max. Operating Temperature	50°C

Ordering Information

Catridge

PTG

Block 1	Block 2	Block 3	Block 4	Block 5	Block 6
Membrane	Removal Ratings	Configuration	O-ring Material	Cleanliness	Package
U=UPE	NM01=1nm NM02=2nm NM03=3nm NM05=5nm NM10=10nm NM20=20nm NM30=30nm NM50=50nm 0010=0.1μm 0020=0.2μm	SIN=Side Inlet CIN=Center Inlet	K=FFKM KZ=Kalrez	UU= Super clean grade UH= High clean grade U= Semicon grade E= Electronic grade	D=Dry W=Prewet, UPW
N=Nylon	NM02=2nm NM05=5nm NM10=10nm NM20=20nm NM40=40nm 0010=0.1μm 0020=0.2μm
M=Multi	NM02=2nm NM03=3nm NM05=5nm NM10=10nm NM20=20nm NM30=30nm NM50=50nm 0010=0.1μm 0020=0.2μm
P=HAPES	NM02=2nm NM05=5nm NM10=10nm NM20=20nm NM30=30nm NM50=50nm 0010=0.1μm
F=PTFE	NM07=7nm NM10=10nm NM15=15nm NM20=20nm NM30=30nm NM50=50nm 0010=0.1μm 0020=0.2μm 0050=0.5μm
F=PTFE

Please contact Cobetter for additional information.

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Hangzhou Cobetter Filtration Equipment Co.,Ltd

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86-571-87704359（English）

86-571-87704270（Japanese）

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sale@cobetterfilter.com

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